SOS offers transparency in making a beneficial deal for you as equipment owner. 
Our system sales process is based upon in-depth market knowledge, long-term international relations- & partnership network - built over 20 years - and guaranteed integrity in the making and executing of the deal. 



The RAIDER  ECD  312 system for 300mm single-wafer, automated, multi-chamber,
electrochemical deposition delivers high throughput in a small footprint.

Complete system incl 2x Neslap HX300 chiller And integrated fire extinguishing system.

Tokyo Electron Trias High K CVD


CVD System, 12” <45nm process Vintage 20102
Chambers: CVD & ALD Process: NiOx, HfOx

Trias cluster: 2 Load ports LM: Front end Main power
distribution (MPD) Transfer module, TM

EX reactor, PM2:Plasma capability: No
Includes:Ozonizer & H20 Box2 Touch screens ozonizer

High-k CVD reactor PM4:Thermal based
deposition Transformer box (Hi-K) option elec. box:

Manuals & Spare parts included
Machine is in absolute as good as new condition ex R&D facility

PM2: Hafnium Nickel Titanium Vanadium
PM4: Hafnium Nickel Titanium Ruthenium Strontium

Sentech Senduro 300


The SENDURO® 300 is a powerful automated tool for the measurement of single 
films and layer stacks on silicon wafers of up to 300 mm diameter.

With features such as: automated alignment, data acquisition, sample modelling, 
analysis of single or multi-layer samples by fitting the model to the measured data, 
display of results and reporting of measured data.

Axcelis Fusion ES3 Asher


System Axcelis ES3 Asher, Vintage Feb-2001 - 300mm, optional 200mm
Includes chiller, pumps and gasboxes. Decommissioned in working conditioning,
in production until April 2022

System comes including following spare parts.

Spare chamber module, all quartz parts used for 1 chamber.
Main computer, 3 microwave units, lamp controllers etc.
Approximately 75 lamps, touchscreen, SMC foreline valve and throttle valve.